The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

May. 16, 2013
Applicant:

Dainippon Screen Mfg. Co., Ltd., Kyoto, JP;

Inventor:

Hideo Nishihara, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 11/00 (2006.01); H01L 21/67 (2006.01); G01N 15/00 (2006.01); G01N 15/06 (2006.01); G01N 15/14 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); G01N 15/00 (2013.01); G01N 15/06 (2013.01); H01L 21/67253 (2013.01); G01N 2015/1486 (2013.01);
Abstract

A heat treatment apparatus includes a chamber for receiving a substrate therein, and a measurement part for measuring an air particle concentration in a processing space provided in the chamber. An air particle concentration in the processing space provided in the chamber is measured by the measurement part. The air particle concentration is correlated with the number of particles attached to a substrate received in the chamber. Accordingly, by conducting a particle test after the air particle concentration in the processing space is lowered to an air particle concentration corresponding to the number of particles existing on the substrate which can pass the particle test, the number of times the particle test should be conducted after maintenance of the heat treatment apparatus can be reduced.


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