The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Mar. 23, 2016
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Tsutomu Ogihara, Jyoetsu, JP;
Taku Morisawa, Jyoetsu, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
The present invention provides a method for forming a coating film for a lithography, comprising the steps of: performing spin coating of a composition for forming a coating film for a lithography onto a substrate for producing a semiconductor device by using a spin coating device provided with an integrated filter in which a filtration membrane and a housing are integrated; and heating the substrate coated with the composition for forming a coating film for a lithography; thereby forming a coating film for a lithography on the substrate, wherein the integrated filter is a filter in which eluting material is in at amount of 3 mg or less per a filter, the eluting material being extracted by circulating an organic solvent at a rate of 10 ml/min for 24 hours. This method enables to form a coating film for a lithography with its coating defects extremely reduced.