The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Sep. 02, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;

Inventors:

Naoki Ueda, Osaka, JP;

Sumio Katoh, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 13/00 (2006.01); G11C 17/16 (2006.01); G11C 17/18 (2006.01); H01L 29/10 (2006.01); H01L 29/24 (2006.01); H01L 29/786 (2006.01); H01L 29/423 (2006.01); H01L 27/112 (2006.01);
U.S. Cl.
CPC ...
G11C 17/16 (2013.01); G11C 17/18 (2013.01); H01L 27/11206 (2013.01); H01L 29/1033 (2013.01); H01L 29/24 (2013.01); H01L 29/42356 (2013.01); H01L 29/7869 (2013.01); G11C 13/0004 (2013.01); G11C 13/0011 (2013.01); G11C 2213/79 (2013.01);
Abstract

A memory cell () includes a memory transistor (A) having channel length Land channel width W, and a plurality of select transistors (B) each electrically being connected in series with the memory transistor and independently having channel length Land channel width W, wherein each of the memory transistor and the plurality of select transistors includes an active layer (A) formed from a common oxide semiconductor film, the memory transistor is a transistor which is capable of being irreversibly changed from a semiconductor state where drain current Ids depends on gate voltage Vg to a resistor state where drain current Ids does not depend on gate voltage Vg, and channel length Lis greater than channel length L


Find Patent Forward Citations

Loading…