The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Nov. 07, 2014
Amo Development, Llc, Sanata Ana, CA (US);
Guang-ming Dai, Fremont, CA (US);
Anatoly Fabrikant, Fremont, CA (US);
Dimitri Chernyak, Sunnyvale, CA (US);
Jayesh Shah, Sunnyvale, CA (US);
AMO Development, LLC, Santa Ana, CA (US);
Abstract
Treatment validation techniques include generating a modified treatment target from an original treatment target using a modification process, and comparing induced aberrations provided by the original and modified treatment targets, so as to verify the modified treatment target or the modification process. In some cases, a modification process may include a deconvolution process, a low pass filter process, a scaling process, or an adjustment process. The induced aberrations may include high order aberrations, such as spherical aberration.