The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Jun. 17, 2015
Kabushiki Kaisha Toshiba, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
According to one embodiment, According to one embodiment, a pattern formation method includes disposing a mask and a substrate separately from each other, the mask having a plurality of light transmitting portions arranged periodically. The method includes irradiating the mask with illumination light emitted from an optical part to irradiate the substrate with at least a part of the illumination light transmitted through the light transmitting portions. a distance d between the mask and the substrate, a wavelength λ of the illumination light, a pitch p of an arrangement of the light transmitting parts, a numerical aperture NAi of the optical part, and at least one natural number n satisfy the following. p≧2λ, (np/λ)−α≦d≦(np/λ)+α, α=p(2λ) and λ/(8np)≦NAi<λ/(2np).