The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Mar. 27, 2014
Olympus Corporation, Shibuya-ku, Tokyo, JP;
Shintaro Fujii, Tokyo, JP;
OLYMPUS CORPORATION, Tokyo, JP;
Abstract
A pattern irradiation apparatus includes a light source unit, an objective, a spatial light modulator, a light blocking member, and a control device. The objective irradiates a sample plane with light emitted from the light source unit. The spatial light modulator is of a phase modulation type and is arranged at a position conjugate with a pupil position of the objective and modulates a phase of the light emitted from the light source unit. The light blocking member is arranged in an optical path between the spatial light modulator and the objective and is configured to block 0-order light generated by the spatial light modulator. The control device makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.