The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
May. 27, 2014
Applicant:
Olympus Corporation, Shibuya-ku, Tokyo, JP;
Inventor:
Eiji Yokoi, Tokyo, JP;
Assignee:
OLYMPUS CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/06 (2006.01); G02B 21/00 (2006.01); G02B 21/16 (2006.01);
U.S. Cl.
CPC ...
G02B 21/0032 (2013.01); G02B 21/0076 (2013.01); G02B 21/16 (2013.01); G02B 21/06 (2013.01); G02B 2207/114 (2013.01);
Abstract
A nonlinear optical microscope apparatus includes: an objective for irradiating a laser beam on a sample; a beam diameter change unit for changing a beam diameter of the laser beam incident to the objective; and a control unit for deciding, for each of optical characteristics of the sample, a pupil filling ratio, which is a ratio of the beam diameter of the laser beam incident to the objective to a pupil diameter of the objective, based on the optical characteristics of the sample, and for controlling the beam diameter change unit so that the pupil filling ratio becomes the decided value.