The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Mar. 06, 2015
Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Shuntaro Ibuki, Kanagawa, JP;

Nobuyuki Akutagawa, Kanagawa, JP;

Miho Asahi, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G02B 1/11 (2015.01); G02B 1/12 (2006.01); G02B 5/30 (2006.01); G02B 1/111 (2015.01); G02B 1/118 (2015.01);
U.S. Cl.
CPC ...
G02B 1/111 (2013.01); G02B 1/118 (2013.01); G02B 1/12 (2013.01); G02B 5/3033 (2013.01); C08J 2333/12 (2013.01); C08J 2427/20 (2013.01); C08J 2429/10 (2013.01); C08J 2435/02 (2013.01);
Abstract

There is provided an antireflection film having a surface haze of less than 1.0%, including: a light transmitting layer; and an antireflection layer, wherein the antireflection layer includes a specific unevenness structure on a surface at a side opposite to a side at which the light transmitting layer is provided, the specific unevenness structure made from specific raw materials.


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