The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2016

Filed:

Feb. 26, 2014
Applicant:

Hitachi, Ltd, Tokyo, JP;

Inventors:

Munenori Degawa, Kokubunji, JP;

Heewon Jeong, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01P 15/125 (2006.01); G01C 19/56 (2012.01); G01P 1/00 (2006.01); G01C 19/5733 (2012.01); G01P 1/02 (2006.01); G01P 15/08 (2006.01); G01C 19/5712 (2012.01);
U.S. Cl.
CPC ...
G01P 1/003 (2013.01); G01C 19/5712 (2013.01); G01C 19/5733 (2013.01); G01P 1/023 (2013.01); G01P 15/0802 (2013.01); G01P 15/125 (2013.01); G01P 2015/0814 (2013.01);
Abstract

In order to provide a technology capable of suppressing degradation of measurement accuracy due to fluctuation of detection sensitivity of an MEMS by suppressing fluctuation in natural frequency of the MEMS caused by a stress, first, fixed portionstoare displaced outward in a y-direction of a semiconductor substrateby deformation of the semiconductor substrate. Since a movable bodyis disposed in a state of floating above the semiconductor substrate, it is not affected and displaced by the deformation of the semiconductor substrate. Therefore, a tensile stress (+σ) occurs in the beamand a compressive stress (−σ) occurs in the beam. At this time, in terms of a spring system made by combining the beamand the beam, increase in spring constant due to the tensile stress acting on the beamand decrease in spring constant due to the compressive stress acting on the beamare offset against each other.


Find Patent Forward Citations

Loading…