The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Oct. 07, 2015
International Business Machines Corporation, Armonk, NY (US);
Russell H. Arndt, Fishkill, NY (US);
Hong He, Schenectady, NY (US);
Gauri Karve, Cohoes, NY (US);
Fee Li Lie, Albany, NY (US);
Muthumanickam Sankarapandian, Niskayuna, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for protecting channels during fin fabrication. Fins are formed on a substrate. A conformal liner layer (or layers) is applied on the fins. Active portions of a semiconductor device are patterned in the fins using a first organic planarizing material. The first organic planarizing material is stripped. The length of the fins is adjusted using a second organic planarizing material. The second organic planarizing material is stripped. The conformal liner layer(s) is stripped.