The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2016

Filed:

Jun. 03, 2014
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Min-Hwan Choi, Yongin, KR;

Chi-Woo Kim, Yongin, KR;

Gun-Shik Kim, Yongin, KR;

Ok-Keun Song, Yongin, KR;

Kee-Han Uh, Yongin, KR;

Seong-Ho Jeong, Yongin, KR;

You-Min Cha, Yongin, KR;

Jae-Beom Choi, Yongin, KR;

Young-Mo Koo, Yongin, KR;

Keum-Nam Kim, Yongin, KR;

Dae-Sung Choi, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/32 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
H01L 27/3211 (2013.01); H01L 27/326 (2013.01); H01L 51/56 (2013.01);
Abstract

A method of manufacturing an organic light emitting display apparatus by utilizing a deposition apparatus for forming an organic layer on a substrate includes: fixing the substrate to a mask assembly for forming a common layer or a mask assembly for forming a pattern layer in a loading unit; when the one or more deposition assemblies are separated from the substrate, forming an intermediate layer by depositing a deposition material discharged from the one or more deposition assemblies in a deposition unit of the deposition apparatus onto the substrate while the substrate is moved relative to the one or more deposition assemblies by a first conveyer unit; and separating the substrate on which the deposition is finished from the mask assembly for forming the common layer or the mask assembly for forming the pattern layer in an unloading unit.


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