The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
May. 01, 2014
AZ Electronic Materials (Luxembourg) S.a.r.l., Somerville, NJ (US);
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
Disclosed are a rinse solution for lithography comprising water and a nonionic surfactant represented by the formula (I) (Rand Rmay be the same as or different from each other and represent a hydrogen atom or a methyl group, Rand Rmay be the same as or different from each other and represent a hydrogen atom, a methyl group or an ethyl group, Rrepresents a hydrocarbon group having 2 to 5 carbon atoms, in which one or more of a double bond or triple bond are contained, or a phenylene group, and Rand Rmay be the same as or different from each other and represent a hydrogen atom or a methyl group) and a method for forming a resist pattern by rinsing the resist pattern obtained by exposing and developing a photosensitive resist with the rinse solution for lithography described above.