The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Jun. 07, 2011
Yusuke Nakai, Hiroshima, JP;
Tetsuya Jigami, Hiroshima, JP;
Tadashi Nakamura, Tokyo, JP;
MITSUBISHI RAYON CO., LTD., Tokyo, JP;
Abstract
A method for producing a product having an uneven microstructure on a surface thereof includes: a step (I) which treats a surface of a roll mold () having an uneven microstructure thereon with an external release agent containing a fluorine and not containing a functional group (B) which reacts with a functional group (A) existing on the surface of the product; and a step (II) which obtains the product having the uneven microstructure on the surface thereof () by inserting an active energy ray curable resin composition () including an internal release agent between the roll mold () and a film (substrate) () after the step (I). Then, the composition is hardened by being irradiated with an active energy ray and a cured resin layer () having a surface, onto which the uneven microstructure is transferred, is formed on the surface of the film ().