The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Jul. 08, 2010
Naoki Kobayashi, Itoigawa, JP;
Mikio Konno, Sendai, JP;
Daisuke Nagao, Sendai, JP;
Yoshihiro Mashiko, Itoigawa, JP;
Toshiaki Otsu, Itoigawa, JP;
Naoki Kobayashi, Itoigawa, JP;
Mikio Konno, Sendai, JP;
Daisuke Nagao, Sendai, JP;
Yoshihiro Mashiko, Itoigawa, JP;
Toshiaki Otsu, Itoigawa, JP;
Denka Company Limited, Tokyo, JP;
Tohoku University, Miyagi, JP;
Abstract
Provided is a polychloroprene latex extremely superior in adhesion properties. According to the present invention, chloroprene or a mixture of chloroprene and a monomer copolymerizable with chloroprene is polymerized in the presence of a surfactant in an aqueous medium, in which the surfactant's concentration is lower than its critical micelle concentration (CMC) to obtain a polychloroprene latex. The polychloroprene latex produced according to the present invention is extremely superior in adhesion properties and others and give a smaller amount of deposits during production.