The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Jun. 21, 2013
SK Hynix Inc., Icheon, KR;
Korea University Research and Business Foundation, Seoul, KR;
Dae Soon Lim, Seoul, KR;
Il Ho Yang, Icheon, KR;
Seung Koo Lee, Seoul, KR;
Dong Hee Shin, Goyang, KR;
Dong Hyeon Lee, Seoul, KR;
Yang Bok Lee, Seoul, KR;
SK HYNIX INC., Icheon, KR;
KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, Seongbuk-Gu, KR;
Abstract
Provided are a polishing composition for chemical mechanical polishing, a method of preparing the polishing composition, and a chemical mechanical polishing method using the polishing composition. The polishing composition which is a water-based polishing composition for planarizing a metal compound thin film including two or more metal elements includes nano-diamond particles as a polishing material and poly(sodium 4-styrenesulfonate) as a dispersion stabilizer for the nano-diamond particles in the polishing composition. Since the nano-diamond particles in the polishing composition have hydrophobic surfaces and poly(sodium 4-styrenesulfonate) effectively stabilizes the nano-diamond particles to prevent the nano-diamond particles from aggregating, excellent polishing characteristics for the metal compound thin film may be obtained due to the nano-diamond particles which have a nano size, high hardness, and excellent dispersibility.