The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2016
Filed:
Mar. 16, 2012
Applicants:
Yang-kyoo Han, Seoul, KR;
Je-gwon Lee, Seoul, KR;
Su-hwa Kim, Seongnam-si, KR;
Inventors:
Assignee:
LG CHEM, LTD., Seoul, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 22/38 (2006.01); H01L 21/3065 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C08F 293/00 (2006.01); G03F 7/00 (2006.01); C08F 220/18 (2006.01); C08F 220/56 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
C08F 22/38 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 293/005 (2013.01); G03F 7/0002 (2013.01); H01L 21/3065 (2013.01); B81C 1/00396 (2013.01); B81C 2201/0149 (2013.01); B81C 2201/0198 (2013.01); C08F 220/18 (2013.01); C08F 220/56 (2013.01); C08F 2438/03 (2013.01);
Abstract
The present invention relates to a diblock copolymer that may facilitate formation of a finer nano pattern, and be used for manufacture of an electronic device including a nano pattern or a bio sensor, and the like, a method for preparing the same, and a method for forming a nano pattern using the same, The diblock copolymer comprises a hard segment including at least one specific acrylamide-based repeat unit, and a soft segment including at least one (meth)acrylate-based repeat unit.