The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2016
Filed:
Jun. 16, 2015
Applicant:
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Inventors:
Kwang-Woo Park, Hwaseong-si, KR;
Jeong-Won Kim, Seoul, KR;
Jun-Hyuk Woo, Seongnam-si, KR;
Gwui-Hyun Park, Hwaseong-si, KR;
Jin-Ho Ju, Seoul, KR;
Assignee:
SAMSUNG DISPLAY CO., LTD., Yongin, Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/32 (2006.01); H01L 27/12 (2006.01); G02B 5/30 (2006.01); G02B 1/08 (2006.01); G02F 1/13 (2006.01); G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
H01L 27/1288 (2013.01); G02B 1/08 (2013.01); G02B 5/3058 (2013.01); G02F 1/1303 (2013.01); G03F 1/38 (2013.01);
Abstract
According to an exemplary embodiment of the present invention, a photomask includes a transparent substrate and a polarizing pattern. A polarizing pattern is disposed on a transparent substrate. The polarizing pattern polarize light.