The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2016
Filed:
Apr. 11, 2014
Applicant:
Seagate Technology Llc, Cupertino, CA (US);
Inventors:
XiaoMin Yang, Livermore, CA (US);
Shuaigang Xiao, Fremont, CA (US);
Kim Y. Lee, Fremont, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Philip Steiner, Los Altosc, CA (US);
Assignee:
Seagate Technology LLC, Cupertino, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 7/00 (2006.01); G11B 5/855 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G11B 5/855 (2013.01); G03F 7/0002 (2013.01);
Abstract
The embodiments disclose a method including patterning a template substrate to have different densities using hierarchical block copolymer density patterns in different zones including a first pattern and a second pattern, using a first directed self-assembly to pattern a first zone in the substrate using a first block copolymer material, and using a second directed self-assembly to pattern a second zone in the substrate using a second block copolymer material.