The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2016

Filed:

May. 31, 2013
Applicant:

Carnegie Mellon University, Pittsburgh, PA (US);

Inventors:

Sara Majetich, Pittsburgh, PA (US);

Tianlong Wen, Pittsburgh, PA (US);

Assignee:

Carnegie Mellon University, Pittsburgh, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23F 1/04 (2006.01); B05D 3/14 (2006.01); G03F 7/00 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C23F 1/04 (2013.01); B05D 3/148 (2013.01); G03F 7/0002 (2013.01); B82Y 40/00 (2013.01); Y10S 977/773 (2013.01); Y10S 977/89 (2013.01); Y10S 977/932 (2013.01);
Abstract

In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.


Find Patent Forward Citations

Loading…