The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2016
Filed:
Jan. 21, 2014
Polymate, Ltd., Migdal Ha'Emeq, IL;
Nanotech Industries, Inc., Daly City, CA (US);
Oleg Figovsky, Haifa, IL;
Raisa Potashnikov, Migdal Ha'Emeq, IL;
Alexander Leykin, Haifa, IL;
Leonid Shapovalov, Nesher, IL;
Olga Birukov, Haifa, IL;
NANOTECH INDUSTRIES, INC., Daly City, CA (US);
POLYMATE, LTD., Migdal Ha'Emeq, IL;
Abstract
A radiation-curable composition comprising (meth)acrylic monomers and/or oligomers, photoinitiators, and a nonreactive composite additive, wherein the nonreactive composite additive comprises a) a biobased hydroxyurethane additive of formula (1):R[—NH—COO—CRH—CRH(OH)]  (1)wherein Ris a residue of the biobased primary diamine, and Rand Rare the same or different and are selected from the group consisting of H, alkyl, and hydroxyalkyl; and b) a silane-based hydroxyurethane additive of formula (2):(R)(OR)Si—R—NH—COO—CRH—CRH(OH)  (2)wherein Rand Rare the same as stated above, Ris generally an aliphatic group having from 1 to 6 carbon atoms, Rand R, independently, are hydrocarbon radicals containing from 1 to 20 carbon atoms and selected from the group consisting of aliphatic, cycloaliphatic, and aromatic groups or combinations thereof, and n is equal to 1, 2, or 3.