The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Feb. 12, 2014
Applicant:

Lapis Semiconductor Co., Ltd., Kanagawa, JP;

Inventor:

Hiroki Kasai, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/113 (2006.01); H01L 31/02 (2006.01); H01L 23/535 (2006.01); H01L 21/74 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02005 (2013.01); H01L 21/743 (2013.01); H01L 23/535 (2013.01); H01L 27/14658 (2013.01); H01L 27/14676 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A semiconductor device includes a first semiconductor layer having a first conductive type; a circuit layer including a second semiconductor layer; and a plurality of layered members. Each of the layered members includes an interlayer insulation film and a wiring layer formed on the interlayer insulation film. The second semiconductor layer includes a circuit element. The layered members form a multilayer wiring layer. The semiconductor device further includes a penetrating conductive member; a conductive portion; and a first conductive type region. The penetrating conductive member penetrates from the first semiconductor layer to the interlayer insulation film of the layered member at the highest position. The conductive portion includes an electrode formed in the wiring layer of the layered member at the highest position and connected to the penetrating conductive member. The first conductive type region has an impurity concentration greater than that of the first semiconductor layer.


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