The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Nov. 19, 2013
Applicant:

Delta Electronics, Inc., Taoyuan Hsien, TW;

Inventors:

Chi-Hsing Huang, Taoyuan Hsien, TW;

Ming-Wei Tsai, Taoyuan Hsien, TW;

Ching-Chuan Shiue, Taoyuan Hsien, TW;

Po-Chin Chuang, Taoyuan Hsien, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/205 (2006.01); H01L 29/20 (2006.01); H01L 29/778 (2006.01); H01L 29/861 (2006.01); H01L 27/06 (2006.01); H01L 21/8252 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
H01L 29/2003 (2013.01); H01L 27/0605 (2013.01); H01L 27/0629 (2013.01); H01L 29/205 (2013.01); H01L 29/7787 (2013.01); H01L 29/861 (2013.01); H01L 21/8252 (2013.01); H01L 27/0883 (2013.01); H01L 2924/0002 (2013.01);
Abstract

The semiconductor device includes a substrate, a first GaN field effect transistor, a second GaN field effect transistor, and a GaN diode. The first GaN field effect transistor is disposed on or above the substrate, and the first GaN field effect transistor is a depletion mode field effect transistor. The second GaN field effect transistor is disposed on or above the substrate, and the second GaN field effect transistor is an enhancement mode field effect transistor. The GaN diode is disposed on or above the substrate. The first GaN field effect transistor, the second GaN field effect transistor, and the GaN diode are disposed on or above a same side of the substrate and electrically connected to each other.


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