The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Apr. 15, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Shuji Yamada, Atsugi, JP;

Tadayuki Yoshitake, Cambridge, MA (US);

Yoichi Ikarashi, Fujisawa, JP;

Takao Ogura, Yokohama, JP;

Takeo Tsukamoto, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/08 (2006.01); H01J 35/16 (2006.01); G21K 1/02 (2006.01); H05G 1/06 (2006.01);
U.S. Cl.
CPC ...
H01J 35/08 (2013.01); H01J 35/16 (2013.01); G21K 1/02 (2013.01); H01J 2235/081 (2013.01); H01J 2235/087 (2013.01); H01J 2235/166 (2013.01); H05G 1/06 (2013.01);
Abstract

The target includes a target layer configured to be irradiated with an electron to generate an X-ray and a support substrate configured to support the target layer. The support substrate includes a polycrystalline diamond and includes multiple structure planes having different area densities of plane orientations from one another. The target layer is supported by the support substrate at a structure plane with a smaller area density of the {101} plane than the area density of the {100} plane and the area density of the {111} plane.


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