The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Mar. 14, 2013
Applicant:

Soitec, Bernin, FR;

Inventors:

Chantal Arena, Mesa, AZ (US);

Ronald Thomas Bertram, Jr., Mesa, AZ (US);

Ed Lindow, Scottsdale, AZ (US);

Christiaan Werkhoven, Gilbert, AZ (US);

Assignee:

Soitec, Bernin, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/14 (2006.01); C30B 25/10 (2006.01); C30B 29/40 (2006.01);
U.S. Cl.
CPC ...
C30B 25/14 (2013.01); C30B 25/10 (2013.01); C30B 29/40 (2013.01);
Abstract

The present invention provides improved gas injectors for use with CVD (chemical vapor deposition) systems that thermalize gases prior to injection into a CVD chamber. The provided injectors are configured to increase gas flow times through heated zones and include gas-conducting conduits that lengthen gas residency times in the heated zones. The provided injectors also have outlet ports sized, shaped, and arranged to inject gases in selected flow patterns. The invention also provides CVD systems using the provided thermalizing gas injectors. The present invention has particular application to high-volume manufacturing of GaN substrates.


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