The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Apr. 30, 2009
Applicants:
Srini Raghavan, Tucson, AZ (US);
Eric Shero, Phoenix, AZ (US);
Mohith Verghese, Phoenix, AZ (US);
Inventors:
Assignee:
ASM America, Inc., Phoenix, AZ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 13/02 (2006.01); C23G 1/22 (2006.01); C11D 7/06 (2006.01); C11D 7/10 (2006.01); C11D 7/26 (2006.01); C11D 11/00 (2006.01); C23C 16/44 (2006.01); C23G 1/18 (2006.01); C23G 1/20 (2006.01);
U.S. Cl.
CPC ...
C23G 1/22 (2013.01); C09K 13/02 (2013.01); C11D 7/06 (2013.01); C11D 7/10 (2013.01); C11D 7/265 (2013.01); C11D 11/0041 (2013.01); C23C 16/4407 (2013.01); C23G 1/18 (2013.01); C23G 1/205 (2013.01);
Abstract
Compositions, methods, and systems permit selectively etching metal oxide from reactor metal parts (e.g., titanium and/or titanium alloys). The etching composition comprises an alkali metal hydroxide and gallic acid. The method is useful for cleaning reaction chambers used in the deposition of metal oxide films such as aluminum oxide.