The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Mar. 05, 2015
Fina Technology, Inc., Houston, TX (US);
Likuo Sun, Houston, TX (US);
Jose Sosa, Deer Park, TX (US);
Serge Eon, Rhode Saint Genese, BE;
Carlos Corleto, Seabrook, TX (US);
Scott Cooper, Humble, TX (US);
Fina Technology, Inc., Houston, TX (US);
Abstract
A process for producing high impact polystyrene including feeding at least one vinyl aromatic monomer, an elastomer, and a free radical initiator to a first linear flow reactor to form a reaction mixture. Polymerizing the reaction mixture in the first linear flow reactor to a point below the point at which phase inversion occurs to produce a first polymerization mixture and feeding the first polymerization mixture from the first linear flow reactor to a second linear flow reactor. Polymerizing the reaction mixture in the second linear flow reactor to at least a phase inversion point of the mixture to produce a second polymerization mixture and feeding the second polymerization mixture from the second linear flow reactor to at least a third linear flow reactor for post-inversion polymerization of the second polymerization mixture. The product stream can have an ESCR value of at least 10% toughness retained with less than 10 wt % rubber content.