The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

Jun. 11, 2010
Applicants:

Vincent Reymond, Antony, FR;

Andriy Kharchenko, Palaiseau, FR;

Nicolas Nadaud, Paris, FR;

Inventors:

Vincent Reymond, Antony, FR;

Andriy Kharchenko, Palaiseau, FR;

Nicolas Nadaud, Paris, FR;

Assignee:

SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03C 17/36 (2006.01); C03C 23/00 (2006.01);
U.S. Cl.
CPC ...
C03C 17/36 (2013.01); C03C 17/366 (2013.01); C03C 17/3613 (2013.01); C03C 17/3626 (2013.01); C03C 17/3639 (2013.01); C03C 17/3644 (2013.01); C03C 17/3681 (2013.01); C03C 23/007 (2013.01); C03C 23/0025 (2013.01);
Abstract

A process for producing a substrate coated on a face with a low-E thin film multilayer, the process including: depositing a thin-film multilayer containing a thin silver film between at least two thin dielectric films and an absorbent film on a face a substrate; and heat treating the coated face with laser radiation between 500 and 2000 nm to reduce at least one selected from the group of the emissivity and the sheet resistance of the multilayer by at least 5%, wherein the absorbent film at least partially absorbs the laser radiation so that the absorption of the multilayer the wavelength of the laser radiation is such that the absorption of a clear glass substrate 4 mm in thickness coated with the multilayer at the wavelength of the laser radiation is greater than or equal to 10%.


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