The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2016
Filed:
Dec. 13, 2012
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Klaus-Uwe Badeke, Götschetal, DE;
Norbert Otto, Teutschenthal, DE;
Martin Trommer, Bitterfeld, DE;
Hilmar Laudahn, Bitterfeld-Wolfen, DE;
Andreas Brueckel, Bitterfeld-Wolfen, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
The invention relates to a method for producing synthetic quartz glass by vaporizing a polyalkylsiloxane as a liquid SiOfeedstock (), converting the vaporized SiOfeedstock () into SiOparticles, separating the SiOparticles, forming a soot body () and vitrifying the soot body (). According to the invention, the vaporizing of the heated SiOfeedstock () comprises an injection phase in an expansion chamber (), in which the SiOfeedstock () is atomized into fine droplets, wherein the droplets have an average diameter of less than 5 pm, and wherein the atomizing of the droplets takes place in a preheated carrier gas stream which has a temperature of more than 180° C.