The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2016

Filed:

May. 25, 2011
Applicants:

Hiroyuki Kubo, Utsunomiya, JP;

Shigeru Hashimoto, Utsunomiya, JP;

Keiji Hirabayashi, Komae, JP;

Koji Teranishi, Utsunomiya, JP;

Yusuke Owaki, Moka, JP;

Inventors:

Hiroyuki Kubo, Utsunomiya, JP;

Shigeru Hashimoto, Utsunomiya, JP;

Keiji Hirabayashi, Komae, JP;

Koji Teranishi, Utsunomiya, JP;

Yusuke Owaki, Moka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01); C03B 11/08 (2006.01); C23C 14/06 (2006.01); C23C 14/32 (2006.01); G02B 3/04 (2006.01);
U.S. Cl.
CPC ...
C03B 11/086 (2013.01); C23C 14/0605 (2013.01); C23C 14/325 (2013.01); G02B 3/04 (2013.01); C03B 2215/12 (2013.01); C03B 2215/24 (2013.01); C03B 2215/72 (2013.01);
Abstract

Provided is a method of producing an optical element forming mold, the method including forming a ta-C filmon a mold matrixfor an optical element forming mold by an FCVA process, in which the mold matrixis kept at a floating potential, a voltage is applied to a mold matrix-holding memberfor holding the mold matrix via insulating members (), and a magnetinternally provided in the mold matrix forms a magnetic field for applying a magnetic force in a normal direction of a transfer surface of the mold matrix so as to follow a magnetic force applied by a filter coil, thereby homogenizing the film quality.


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