The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Jun. 14, 2013
Applicant:

Nederlandse Organisatie Voor Toegepast—natuurwetenschappelijk Onderzoek Tno, 's-Gravenhage, NL;

Inventors:

Jasper Michels, 's-Gravenhage, NL;

Paulus Wilhelmus Maria Blom, 's-Gravenhage, NL;

Georg Thomas Jakob Götz, 's-Gravenhage, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/50 (2006.01); H01L 51/42 (2006.01); H01L 51/56 (2006.01); C23C 14/22 (2006.01); C23C 14/54 (2006.01); H01L 51/44 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
H01L 51/5088 (2013.01); C23C 14/22 (2013.01); C23C 14/54 (2013.01); H01L 51/42 (2013.01); H01L 51/44 (2013.01); H01L 51/5012 (2013.01); H01L 51/56 (2013.01); H01L 51/0037 (2013.01); H01L 2251/5392 (2013.01); H01L 2251/568 (2013.01); Y02E 10/549 (2013.01);
Abstract

A method of manufacturing an electro-optical device stack () includes providing a multi-layered structure comprising an electro-optical layer () that contacts a charge injection layer () comprising an acidic compound (). A resist layer () is deposited onto the electro-optical layer () and comprises a cationically-crosslinkable resist material () that reacts adjacent breaches (12',13′) in the electro-optical layer () by a cross-linking reaction. This reaction is induced by protons () from the charge injection layer () and results in covering of the breaches (12′,13′) with patches () comprising cross-linked resist material (). Parts of the resist material () that have not cross-linked are removed, whereas the remaining patches () provide electrical insulation between the charge injection layer () and a layer subsequently deposited onto the electro-optical layer ().


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