The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Oct. 19, 2015
Applicant:

Vanguard International Semiconductor Corporation, Hsinchu, TW;

Inventors:

Pei-Heng Hung, New Taipei, TW;

Manoj Kumar, Dhanbad, IN;

Hsiung-Shih Chang, Taichung, TW;

Chia-Hao Lee, New Taipei, TW;

Jui-Chun Chang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/02 (2006.01); H01L 27/108 (2006.01); H01L 29/786 (2006.01); H01L 29/73 (2006.01); H01L 29/08 (2006.01); H01L 29/10 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7302 (2013.01); H01L 27/1203 (2013.01); H01L 29/0804 (2013.01); H01L 29/0821 (2013.01); H01L 29/0834 (2013.01); H01L 29/0839 (2013.01); H01L 29/1004 (2013.01);
Abstract

The invention provides a semiconductor device, including a buried oxide layer disposed on a substrate. A semiconductor layer having a first conduction type is disposed on the buried oxide layer. A first well region having the first conduction type is disposed in the semiconductor layer. A second well and a third well having a second conduction type are disposed to opposite sides of the first well region. The second well and the third well are separated from the first well region. A first anode doped region is disposed in the second well. A second anode doped region and a third anode doped region having the first conduction type are disposed in the second well. The second anode doped region is positioned directly on the third anode doped region. A first cathode doped region is coupled to the third well.


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