The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Jun. 10, 2013
Applicant:

Apple Inc., Cupertino, CA (US);

Inventors:

Ralph Brunner, Cupertino, CA (US);

Michael Chin, Belmont, CA (US);

Assignee:

Apple Inc., Cupertino, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 5/232 (2006.01); H04N 5/235 (2006.01); G06K 9/40 (2006.01); G03B 13/36 (2006.01);
U.S. Cl.
CPC ...
G03B 13/36 (2013.01); H04N 5/23212 (2013.01); H04N 5/23216 (2013.01);
Abstract

Systems, methods, and computer readable media to provide improved autofocus operations are described. In general, techniques are disclosed that show how to improve contrast-based autofocus operations by applying a novel threshold-and-select action to window-specific focus scores. More particularly, techniques disclosed herein may evaluate a multi-window autofocus area over a burst collected group of images. For each captured image, focus scores for each window within an autofocus area may be collected, aggregated and then consolidated to identify a single focus metric and its associated lens position for each window. The window-specific focus scores may be reviewed and selection of a 'best' autofocus lens position made using a selection criteria. The specified criteria may be used to bias the selection to either a front-of-plane (macro) or back-of-plane (infinity) focus position.


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