The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2016
Filed:
Dec. 13, 2014
Applicant:
Seiko Epson Corporation, Tokyo, JP;
Inventor:
Toru Nimura, Matsumoto, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01); G02B 3/00 (2006.01); G03B 13/24 (2006.01); G02F 1/1335 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
G02B 3/0043 (2013.01); G02B 3/0006 (2013.01); G02B 3/0012 (2013.01); G02B 3/0056 (2013.01); G03B 13/24 (2013.01); G02F 1/133526 (2013.01); H01L 27/14603 (2013.01); H01L 27/14627 (2013.01);
Abstract
A microlens array includes a cell, and P lenses (P is an integer of 4 or more) arranged in the cell, in which the apexes of the P lenses are arranged such that symmetry is at least partially broken, when viewed in plan view. In this way, it is possible to suppress diffraction caused by regularity in the lens shape in the cell. Accordingly, it is possible to realize a microlens with a high utilization efficiency of light.