The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Jul. 25, 2014
Applicant:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Inventors:

Kiho Yang, Hwaseong-si, KR;

Seunghune Yang, Seoul, KR;

Sibo Cai, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/956 (2006.01); G06K 9/46 (2006.01); G06T 11/60 (2006.01); G01N 21/88 (2006.01); G03F 7/20 (2006.01); G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01N 21/88 (2013.01); G01N 21/8851 (2013.01); G03F 7/70616 (2013.01); G06K 9/4604 (2013.01); G06T 7/001 (2013.01); G06T 7/0006 (2013.01); G06T 11/60 (2013.01); G06T 2207/20221 (2013.01); G06T 2207/30148 (2013.01);
Abstract

Inventive concepts provide a method of inspecting a semiconductor device including obtaining inspection image data of an inspection pattern of an inspection layer on a substrate. The method may include extracting inspection contour data including an inspection pattern contour from the inspection image data, and merging the inspection contour data with comparison contour data of a comparison layer to obtain merged data. The comparison layer may overlap the inspection layer. The method may also include determining a horizontal distance between the inspection pattern contour and a comparison pattern contour of the comparison contour data based on the merged data.


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