The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Oct. 22, 2010
Applicants:

Satoshi Kondo, Miyoshi, JP;

Chikara Ohto, Miyoshi, JP;

Norihiro Mitsukawa, Toyota, JP;

Kenichi Ogawa, Kyoto, JP;

Inventors:

Satoshi Kondo, Miyoshi, JP;

Chikara Ohto, Miyoshi, JP;

Norihiro Mitsukawa, Toyota, JP;

Kenichi Ogawa, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01H 5/00 (2006.01); A01H 1/00 (2006.01); C12N 15/82 (2006.01); C07K 14/415 (2006.01); C12N 9/12 (2006.01); C12N 15/00 (2006.01);
U.S. Cl.
CPC ...
C12N 15/8273 (2013.01); C07K 14/415 (2013.01); C12N 9/1205 (2013.01); C12N 15/8271 (2013.01);
Abstract

According to the present invention, environmental stress resistance is imparted to a plant or the environmental stress resistance of a plant is improved. At least one gene selected from the group consisting of an LRR-RLP gene selected from a 1st group (including At2g33080), an LRR-RLK gene selected from a 2nd group (including At1g69990), and an LRR-RLK gene selected from a 3rd group (including At5g39390) is introduced into a plant, or an expression control region of an endogenous gene is altered in a plant.


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