The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2016

Filed:

Jul. 27, 2012
Applicants:

Yoshiaki Matsuzawa, Tokyo, JP;

Kousuke Ishii, Tokyo, JP;

Hiroshi Tanaka, Tokyo, JP;

Junji Yamamura, Tokyo, JP;

Inventors:

Yoshiaki Matsuzawa, Tokyo, JP;

Kousuke Ishii, Tokyo, JP;

Hiroshi Tanaka, Tokyo, JP;

Junji Yamamura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12M 1/107 (2006.01); C12N 1/12 (2006.01); C12M 1/00 (2006.01); C12M 3/00 (2006.01);
U.S. Cl.
CPC ...
C12N 1/12 (2013.01); C12M 21/02 (2013.01); C12M 23/18 (2013.01); C12M 23/36 (2013.01); C12M 23/48 (2013.01);
Abstract

The culture device () for culturing algae includes a culture pond () including an opening () on an upper side thereof and accommodating an alga solution (M) as a culture solution containing algae; a sheet () having optical transparency and flexibility, the sheet sealing at least a portion of the opening () of the culture pond (); and a gas supply unit () used to supply high concentration COgas having a higher concentration of carbon dioxide than that of the atmosphere, between the culture pond () and the sheet (). A gas storage space (G) to store gas between a liquid surface () of the alga solution (M) and the sheet () is formed by at least part of the supplied high concentration COgas.


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