The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2016

Filed:

Aug. 04, 2014
Applicant:

Stmicroelectronics (Rousset) Sas, Rousset, FR;

Inventors:

Yoann Goasduff, Fuveau, FR;

Abderrezak Marzaki, Marseilles, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/76 (2006.01); H01L 21/308 (2006.01); H01L 21/266 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); H01L 21/0337 (2013.01); H01L 21/266 (2013.01); H01L 21/3081 (2013.01); H01L 21/3085 (2013.01);
Abstract

At least one projecting block is formed in an element. The projecting block is then covered with a first cover layer so as to form a concave ridge self-aligned with the projecting block and having its concavity face towards the projecting block. A first trench is then formed in the ridge in a manner that is self-aligned with both the ridge and the projecting block. The first trench extends to a depth which reaches the projecting block. The projecting block is etched using the ridge and first trench as an etching mask to form a second trench in the projecting block that is self-aligned with the first trench. A pattern is thus produced by the second trench and unetched parts of the projecting block which delimit the second trench.


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