The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Mar. 18, 2015
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Samsung Display Co., Ltd., Yongin-si, KR;
Abstract
A method of forming a metal pattern is disclosed. According to the method, a gate electrode and a pixel electrode are formed on a substrate. A metal layer is formed covering the gate electrode and the pixel electrode. A photo pattern is formed wherein a thickness of an area of the photo pattern that overlaps the gate electrode is smaller than a thickness of other areas of the photo pattern. The photo pattern is soft-baked. The photo pattern is exposed to light. The photo pattern is developed to expose a portion of the metal layer that overlaps the gate electrode. The exposed portion of the metal layer is removed to form a source electrode and a drain electrode, the source electrode and the drain electrode being spaced apart from each other with respect to the gate electrode.