The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Nov. 29, 2011
Applicants:
Yoshimasa Chikama, Osaka, JP;
Iwao Suzuki, Osaka, JP;
Inventors:
Yoshimasa Chikama, Osaka, JP;
Iwao Suzuki, Osaka, JP;
Assignee:
SHARP KABUSHIKI KAISHA, Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/35 (2006.01); C23C 14/08 (2006.01); C23C 14/56 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/352 (2013.01); C23C 14/08 (2013.01); C23C 14/564 (2013.01); H01J 37/3417 (2013.01); H01J 37/3429 (2013.01); H01J 37/3447 (2013.01); H01J 37/3455 (2013.01);
Abstract
A thin film forming apparatus includes a substrate holding portion and a target portion. The target portion has a plurality of targets arranged at predetermined intervals and parallel to a substrate held by the substrate holding portion. The substrate holding portion is configured to move the substrate parallel to the target portion. A shield portion configured to block sputtered particles flying from the target portion is placed on the target portion side of the substrate so as to face a gap between adjoining ones of the targets.