The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2016

Filed:

Mar. 07, 2014
Applicant:

Robert Bosch Gmbh, Stuttgart, DE;

Inventors:

Andrew Graham, Redwood City, CA (US);

Gary Yama, Mountain View, CA (US);

Gary O'Brien, Palo Alto, CA (US);

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); B81B 3/00 (2006.01);
U.S. Cl.
CPC ...
B81B 3/0021 (2013.01); B81C 1/00095 (2013.01); B81C 1/00166 (2013.01); B81B 2201/0271 (2013.01); B81B 2203/04 (2013.01); B81B 2203/053 (2013.01); B81C 2201/014 (2013.01); B81C 2201/0132 (2013.01); B81C 2201/0177 (2013.01); B81C 2203/0136 (2013.01);
Abstract

In one embodiment, a method of forming an out-of-plane electrode includes forming an oxide layer above an upper surface of a device layer, etching an etch stop perimeter defining trench extending through the oxide layer, forming a first cap layer portion on an upper surface of the oxide layer and within the etch stop perimeter defining trench, etching a first electrode perimeter defining trench extending through the first cap layer portion and stopping at the oxide layer, depositing a first material portion within the first electrode perimeter defining trench, depositing a second cap layer portion above the deposited first material portion, and vapor releasing a portion of the oxide layer with the etch stop portion providing a lateral etch stop.


Find Patent Forward Citations

Loading…