The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Jul. 01, 2013
Applicant:
Massachusetts Institute of Technology, Cambridge, MA (US);
Inventors:
Hyungryul Choi, Cambridge, MA (US);
Jeong-gil Kim, Cambridge, MA (US);
Kyoo Chul Park, Cambridge, MA (US);
Robert E. Cohen, Jamaica Plain, MA (US);
Gareth H. McKinley, Acton, MA (US);
George Barbastathis, Boston, MA (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 3/30 (2006.01); B29C 59/02 (2006.01); B29C 33/42 (2006.01); G03F 7/00 (2006.01); B81C 1/00 (2006.01); B29C 33/38 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
B32B 3/30 (2013.01); B29C 33/424 (2013.01); B29C 59/02 (2013.01); B81C 1/0046 (2013.01); B81C 1/00206 (2013.01); G03F 7/0002 (2013.01); B29C 33/3842 (2013.01); B82Y 40/00 (2013.01); Y10T 428/24479 (2015.01);
Abstract
Inverted Nanocone Structures and Its Fabrication Process. The method of fabricating nanotextured structures includes making a master mold having an array of tapered structures to be replicated. The master mold is pressed into a curable polymer supported on a substrate and the polymer is cured. Thereafter, the mold is detached from the cured polymer to form the nanotextured structure.