The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Jan. 20, 2015
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventor:

Yusuke Tsukagoshi, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14685 (2013.01); H01L 27/14623 (2013.01); H01L 27/14627 (2013.01); H01L 27/14629 (2013.01);
Abstract

A method of manufacturing a solid-state imaging apparatus, comprising preparing a substrate on which photoelectric conversion portions are arranged, forming inner lenses corresponding to the photoelectric conversion portions, and forming microlenses corresponding to the photoelectric conversion portions, wherein the forming inner lenses includes forming, on the substrate, a dielectric film for forming the plurality of inner lenses, and etching second portions of the dielectric film around first portions serving as central portions of the inner lenses while leaving upper faces of the first portions, so as to form curved faces or inclined faces connected to the upper faces.


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