The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2016

Filed:

Feb. 02, 2015
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Geetha Adinarayan, Bangalore, IN;

Anindya Neogi, New Delhi, IN;

Vinay G. Rajagopal, Yelahanka New Town, IN;

Rohit Shetty, Bangalore, IN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 11/00 (2006.01); G06F 11/07 (2006.01);
U.S. Cl.
CPC ...
G06F 11/079 (2013.01); G06F 11/0706 (2013.01); G06F 11/0751 (2013.01); G06F 11/0793 (2013.01);
Abstract

An expert system extracts events associated with executing an application from log files generated by various topological resources in a distributed computing environment. The events are plotted as plot points on a time series graph. Patterns are identified in the plot points that are associated with application problems, along with the computing environment configurations both before the problem and after the problem was resolved. The difference in the configurations represents a corrective action for the application problem, and the expert system links the corrective action to the pattern. When a pattern repeats in conjunction with another application problem, the corrective action is identified as a possible solution to the new problem. A confidence level associated with the pattern/corrective action may be increased when a user accepts the corrective action and may be decreased when a user rejects the corrective action.


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