The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Jul. 11, 2012
Applicant:
Boris Kobrin, Dublin, CA (US);
Inventor:
Boris Kobrin, Dublin, CA (US);
Assignee:
Rolith, Inc., Pleasanton, CA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/24 (2006.01); G03F 7/20 (2006.01); G03F 1/34 (2012.01); G03F 1/00 (2012.01); G03F 7/00 (2006.01); G03F 1/50 (2012.01); G03F 1/60 (2012.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/2035 (2013.01); B82Y 40/00 (2013.01); G03F 1/0007 (2013.01); G03F 1/0084 (2013.01); G03F 1/50 (2013.01); G03F 1/60 (2013.01); G03F 7/0012 (2013.01); G03F 7/2032 (2013.01); G03F 7/2014 (2013.01);
Abstract
Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.