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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9464172 B1

PDFFull Text
Date of Patent:
Oct. 11, 2016

Filed:

Dec. 05, 2008

Alkali-developable curable composition, insulating thin film using the same, and thin film transistor

Applicants:

Masahito Ide, Settsu, JP;

Takao Manabe, Settsu, JP;

Makoto Seino, Settsu, JP;

Inventors:

Masahito Ide, Settsu, JP;

Takao Manabe, Settsu, JP;

Makoto Seino, Settsu, JP;

Assignee:

Kaneka Corporation, Osaka, JP;

Attorney:

Hamre, Schumann, Mueller & Larson, P.C.

Primary Examiner:

Venkataraman Balasubramanian

Int. Cl.
CPC ...
C07D 251/32 (2006.01); C07D 251/34 (2006.01); C08G 77/388 (2006.01); C08K 5/3492 (2006.01); C08L 83/06 (2006.01); G03F 7/075 (2006.01); H01L 21/312 (2006.01); H01L 29/786 (2006.01); H01L 21/02 (2006.01); H01L 23/29 (2006.01); H01L 29/49 (2006.01); H01L 51/05 (2006.01); C08K 5/549 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
C08G 77/388 (2013.01); G03F 7/0755 (2013.01); G03F 7/0757 (2013.01); H01L 21/02126 (2013.01); H01L 21/02216 (2013.01); H01L 21/02219 (2013.01); H01L 21/02282 (2013.01); H01L 21/02343 (2013.01); H01L 21/02348 (2013.01); H01L 21/3122 (2013.01); H01L 23/296 (2013.01); H01L 29/4908 (2013.01); H01L 29/78609 (2013.01); H01L 51/052 (2013.01); C08K 5/549 (2013.01); H01L 27/1248 (2013.01); H01L 29/7869 (2013.01); H01L 2924/0002 (2013.01); H01L 2924/12044 (2013.01);
Abstract

An object of the present invention is to provide a polysiloxane compound that can be developed in an aqueous alkali solution and can yield a cured product or thin film having superior heat-resistant transparency and insulating properties, a curable composition thereof, and a thin film transistor provided with a passivation layer or gate insulator using the same, and the present invention relates to a polysiloxane compound having at least one photopolymerizable functional group in a molecule thereof, and having at least one member selected from the group consisting of an isocyanuric acid backbone structure, a phenolic hydroxyl group and a carboxyl group within the same molecule, to a curable composition containing the polysiloxane compound, and to a cured product thereof.

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