The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Mar. 12, 2014
Fujifilm Corporation, Tokyo, JP;
Takashi Aoki, Saitama, JP;
Youichi Sawachi, Saitama, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
After AE/AF/AWB operation, a subject distance is calculated for each pixel, and a histogram which shows the distance distribution is created based thereon. The class with the highest frequency which is the peak at the side nearer than the focus distance is searched based on the histogram and a rectangular area Ln which includes pixels which have a subject distance within the searched range is set. The average parallax amount Pn which is included in the rectangular area Ln is calculated and it is confirmed whether Pn is within a range of parallax amounts a and a−t1. In a case where Pn is not within a range of parallax amounts a and a−t1 which is set in advance, the aperture value is adjusted such that Pn is within the range of the parallax amounts a and a−t1.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile