The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2016

Filed:

Oct. 10, 2014
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Keon-Yong Cheon, Yongin-si, KR;

Il-Ryong Kim, Hwaseong-si, KR;

Dong-Won Kim, Seongnam-si, KR;

Assignee:

SAMSUNG ELECTRONICS CO., LTD., Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 29/423 (2006.01); H01L 29/49 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/8234 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
H01L 29/42372 (2013.01); H01L 21/823842 (2013.01); H01L 27/092 (2013.01); H01L 29/4966 (2013.01); H01L 29/66545 (2013.01); H01L 29/66636 (2013.01); H01L 29/78 (2013.01); H01L 21/82345 (2013.01); H01L 27/088 (2013.01);
Abstract

Provided is a semiconductor device having mid-gap work function metal gate electrodes. The semiconductor device includes a plurality of gate patterns, and the gate patterns have different gate electrode metals from each other or different gate electrode metal thicknesses from each other.


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