The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2016
Filed:
Aug. 19, 2015
Seagate Technology Llc, Cupertino, CA (US);
Yuan Xu, Fremont, CA (US);
Kim Y. Lee, Fremont, CA (US);
David S. Kuo, Palo Alto, CA (US);
Koichi Wago, Sunnyvale, CA (US);
Wei Hu, Newark, CA (US);
Seagate Technology LLC, Cupertino, CA (US);
Abstract
A method for nano-patterning includes imprinting features in a resist with an imprint mold to form one or more topographic surface patterns on the imprinted resist. A block copolymer ('BCP') material is deposited on the imprinted resist, wherein a molecular dimension Lof the BCP material correlates by an integer multiple to a spacing dimension of the one or more topographic surface patterns on the imprinted resist. The deposited BCP is annealed and at least a portion of the annealed BCP is removed, forming a template having discrete domains.