The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2016

Filed:

Jan. 13, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Christos Dimitrakopoulos, Baldwin Place, NY (US);

Augustin J. Hong, White Plains, NY (US);

Jeehwan Kim, White Plains, NY (US);

Devendra K. Sadana, Pleasantville, NY (US);

Kuen-Ting Shiu, White Plains, NY (US);

Assignee:

GLOBALFOUNDRIES, INC, Grand Cayman, KY;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/02 (2006.01); G06F 3/06 (2006.01); H04W 8/06 (2009.01); H01L 31/0236 (2006.01); G06F 11/07 (2006.01); G06F 12/02 (2006.01); H04L 29/08 (2006.01); G06F 11/10 (2006.01); H04W 8/04 (2009.01);
U.S. Cl.
CPC ...
G06F 3/061 (2013.01); G06F 3/064 (2013.01); G06F 3/0647 (2013.01); G06F 3/0653 (2013.01); G06F 3/0689 (2013.01); G06F 11/0727 (2013.01); G06F 12/02 (2013.01); H01L 31/02366 (2013.01); H04L 67/1002 (2013.01); H04W 8/065 (2013.01); G06F 11/1076 (2013.01); H04W 8/04 (2013.01); Y02E 10/50 (2013.01);
Abstract

A method for fabricating a photovoltaic device includes applying a diblock copolymer layer on a substrate and removing a first polymer material from the diblock copolymer layer to form a plurality of distributed pores. A pattern forming layer is deposited on a remaining surface of the diblock copolymer layer and in the pores in contact with the substrate. The diblock copolymer layer is lifted off and portions of the pattern forming layer are left in contact with the substrate. The substrate is etched using the pattern forming layer to protect portions of the substrate to form pillars in the substrate such that the pillars provide a radiation absorbing structure in the photovoltaic device.


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