The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 04, 2016

Filed:

Mar. 26, 2014
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Jungi Kim, Guri-si, KR;

Taegyun Kim, Yongin-si, KR;

Jin-Su Byun, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/38 (2012.01); G03F 1/00 (2012.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 1/00 (2013.01); G03F 7/0007 (2013.01); G03F 7/20 (2013.01);
Abstract

An exposure mask for forming a pattern in a photosensitive material includes a mask substrate which is disposed facing the photosensitive material; a body portion on the mask substrate and corresponding to a shape of the pattern at a distance furthest from the exposure mask; and a plurality of branch portions on the mask substrate and each extending outward from an outer edge of the body portion, in a plan view. The pattern comprises a contact hole of a display device.


Find Patent Forward Citations

Kim, Jungi. (2016). Exposure mask and method of fabricating display panel using the same (U.S. Patent No. 9459522). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9459522

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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